O2 Technology https://www.o2teco.com/ Semiconductor Company Thu, 04 Jul 2019 23:33:50 +0000 en-US hourly 1 https://wordpress.org/?v=6.7.1 https://i0.wp.com/www.o2teco.com/wp-content/uploads/2017/02/cropped-O2-logodraft02.png?fit=32%2C32&ssl=1 O2 Technology https://www.o2teco.com/ 32 32 123220505 O2 Technology to exhibit at SEMICONWEST2019 https://www.o2teco.com/2019/07/03/o2-technology-to-exhibit-at-semicowest2019/ Wed, 03 Jul 2019 19:47:53 +0000 http://www.o2teco.com/?p=2156 Posters to be displayed in the O2 technology’s booth

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Posters to be displayed in the O2 technology’s booth

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Identification and quantification of FOUP molecular contaminants inducing defects in integrated circuits manufacturing https://www.o2teco.com/2017/02/04/identification-quantification-foup-molecular-contaminants-inducing-defects-integrated-circuits-manufacturing/ Sat, 04 Feb 2017 07:27:25 +0000 http://www.o2teco.com/?p=612 Thi Quynh Nguyen a,b,⇑, Hervé Fontaine a, Yannick Borde b, Véronique Jacob c Abstract In the semiconductor industry, the control of contaminants is mandatory in order to prevent their detrimental impact on manufacturing yield. More specifically, it has been found that molecular contaminants coming from FOUPs could lead to defects on wafer. This paper presents two cases …

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Thi Quynh Nguyen a,b,⇑, Hervé Fontaine a, Yannick Borde b, Véronique Jacob c

Abstract

In the semiconductor industry, the control of contaminants is mandatory in order to prevent their detrimental impact on manufacturing yield. More specifically, it has been found that molecular contaminants coming from FOUPs could lead to defects on wafer. This paper presents two cases related with defects induced by molecular contamination, namely crystal growth and corrosion issues, respectively along two process sequences: (1) copper interconnect patterning and (2) Ionic Implantation of N-type or P-type
dopants before Spacer Deposition. Three main ionic contaminants have been identified: HF, CH3COOH, HCOOH with levels varying from few ppbv to few tens of ppbv. In the first process sequence, dry Etching step has been identified as the source of contamination. In the second process sequence CF4 dry Stripping step generates HF. On the other hand, dry Stripping step and Implantation step generate CH3COOH, HCOOH. Organic contaminants have been characterized showing that the FOUP atmosphere represents
a contaminated environment (about few tens of ppbv for total organics). A specific organic composition has been identified for in-process FOUPs but has not been related to a process or defects.

 

 

 

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SEMICON KOREA 2017 https://www.o2teco.com/2017/01/11/semicon-korea-2017/ Wed, 11 Jan 2017 08:15:31 +0000 http://www.o2teco.com/?p=188 Event Overview SEMICON Korea 2017 is one of the biggest events for semiconductor industry in Korea. The event will be the largest SEMICON Korea in its 30 year history in terms of its size as well as the number of exhibitors. The global industry looks to SEMICON Korea for the most up-to-date information on the tools, technologies, and …

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Event Overview

SEMICON Korea 2017 is one of the biggest events for semiconductor industry in Korea. The event will be the largest SEMICON Korea in its 30 year history in terms of its size as well as the number of exhibitors.

The global industry looks to SEMICON Korea for the most up-to-date information on the tools, technologies, and trends driving the design, manufacture, and business of microelectronics, giving you access to the people, products, and information you need to see now.

Exhibition Time

Open Close
FEB 8-9 10:00 17:30
FEB 10 10:00 17:00

Registration

Visitor and program registration will be open from November 16. With online complimentary registration, you can access to SEMICON Korea 2017 exhibition and keynote speech as free of charge. Other paid seminars are available with discounted fees. For more information, Click here.

Exhibits

SEMICON Korea features more than 600 international exhibitors showcasing products and services from about 20 countries.

Event / Program Schedule

SEMICON Korea 2017 will provide a chance to share the vision for present, future of semiconductor industry with various programs including SEMI Standards events. Click here to preview the current schedule of events.

Hotel / Travel

SEMI has reserved sufficient number of rooms at hotels near the show venue with special rates. It is recommended that you make your hotel reservations at the earliest convenience. For more information, Click here


Contact

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Hello world! https://www.o2teco.com/2017/01/03/hello-world/ https://www.o2teco.com/2017/01/03/hello-world/#comments Tue, 03 Jan 2017 20:21:18 +0000 http://www.o2teco.com/?p=1 Under Construction !  Coming Soon !

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Under Construction !  Coming Soon !

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